ЛАБОРАТОРИЯ ПЛАЗМЕННЫХ ИСТОЧНИКОВ

ШАНДРИКОВ Максим Валентинович

должность: старший научный сотрудник
ученая степень: кандидат технических наук (2005 г.)
e-mail: shandrikov@opee.hcei.tsc.ru

Список наиболее значимых публикаций

1. Gridless, very low energy, high-current, gaseous ion source//Review of Scientific Instruments 81 (2) 02B307 (2009) https://doi.org/10.1063/1.3259233
2. Boron ion beam generation using a self-sputtering planar magnetron// Review of Scientific Instruments 85 (2) 02C302 (2013) https://doi.org/10.1063/1.4824643
3. A bulk plasma generator based on a plasma cathode discharge// Instruments and Experimental Techniques 46 (3) 384-387 (2003) https://doi.org/10.1023/A:1024478708509
4. Generation of space charge compensated low energy ion flux// Review of Scientific Instruments 79 (2) 02B719 (2008) https://doi.org/10.1063/1.2823891
5. Inverted end-Hall-type low-energy high-current gaseous ion source// Review of Scientific Instruments 79 (2) 02B302 (2008) https://doi.org/10.1063/1.2801348
6. Low-energy dc ion source for low operating pressure// Review of Scientific Instruments 85, 083502 (2014) https://doi.org/10.1063/1.4891697
7. TRIATOMIC HYDROGEN ION GENERATION IN A LOW-PRESSURE GAS DISCHARGE // VACUUM, 162, 2019, 63-66, DOI: 10.1016/j.vacuum.2019.01.025
8. Planar magnetron discharge with confinement of injected electrons// Vacuum, 192, 2021, DOI10.1016/j.vacuum.2021.110487
9. Deposition of tungsten disilicide films by DC magnetron sputtering at ultra-low operating pressure// Surf&Coat.Techn., 422, 2021, DOI10.1016/j.surfcoat.2021.127501
10. Adhesion and friction performance of DLC/rubber: The influence of plasma pretreatment// Friction 9, 627–641 (2021) https://doi.org/10.1007/s40544-020-0436-6
11. Mass-to-charge ion composition of plasma in a magnetron discharge with reactive sputtering of titanium target// PLASMA PROCESSES AND POLYMERS, 18 (3) , DOI10.1002/ppap.202000210
12. Parameters and properties of a pulsed planar vacuum magnetron discharge// Vacuum, 2020, 178, 109400. doi.org/10.1016/j.vacuum.2020.109400
13. Deposition of Cu-films by a planar magnetron sputtering system at ultra-low operating pressure// Surface and Coatings Technology, 2020, 389, 125600. doi.org/10.1016/j.surfcoat.2020.125600
14. NBR surface modification by gaseous plasma source with electron injection// Surface and Coatings Technology, 2020, 388, 125556. doi.org/10.1016/j.surfcoat.2020.125556
15. Effects of gas pressure and discharge current on beam composition in a magnetron discharge ion source// Review of Scientific Instruments, 2019, 90(11), 113312. doi.org/10.1063/1.5125950
16. Effect of electron injection on the parameters of a pulsed planar magnetron// Vacuum, V.159, p. 200-203, 2019. https://doi.org/10.1016/j.vacuum.2018.10.042
17. Ion mass-to-charge ratio in planar magnetron plasma with electron injections// JOURNAL OF PHYSICS D: APPLIED PHYSICS, V.51(41), 415201, 2018 https://doi.org/10.1088/1361-6463/aadbd6
18. Planar magnetron sputtering with supplementary electron injection// Vacuum, V.143, P. 458-463, 2017 DOI: 10.1016/j.vacuum.2017.02.011
19. Operating modes of a hydrogen ion source based on a hollow-cathode pulsed Penning discharge// Review of Scientific Instruments, V.87, 02B703 (2016). http://dx.doi.org/10.1063/1.4931800. - импакт-фактор 1,5
20. Magnetron discharge-based boron ion source// AIP Conference Proceedings 2011,090005 (2018)